工作气压对Y掺杂HfO2结构及电学性能的影响
惠迎雪, 刘雷, 赵吉武, 张长明, 秦兴辉, 刘卫国
Effect of Working Pressure on Structure and Electrical Properties of Y-Doped HfO2 Thin Films
XI Ying-xue, LIU Lei, ZHAO Ji-wu, ZHANG Chang-ming, QIN Xing-hui, LIU Wei-Guo
表面技术 . 2023, (8): 340 -345, 354 .  DOI: 10.16490/j.cnki.issn.1001-3660.2023.08.028