目的 研究 ZnO:Si 薄膜厚度对其生长速率、结晶度、光透率和电阻率的影响。 方法 用直流磁控溅射系统在玻璃基片上沉积不同的时间,获得 5 个厚度不同的 ZnO:Si 薄膜样品,对比研究了其薄膜生长取向和结构特性、微观形貌、电学参数及透过率曲线。 结果 5 个 ZnO:Si 薄膜样品都为多晶膜,具有单一的(002) 衍射峰,沿垂直于基片的 c 轴方向择优生长。 当薄膜厚度从 207. 6 nm 增加到436. 1 nm 时, 薄膜的晶粒尺寸增大,晶化程度提高,电阻率变小;膜厚增至 497 . 8 nm 时,薄膜的晶化程度反而降低,电阻率增加。 在可见光范围内,5 个薄膜样品的平均透过率都高于 91 . 7 % 。 结论 膜厚对 ZnO:Si 薄膜的电学性能有较大影响,对光学性能的影响则较小。

Objective To investigate the effect of the film thickness on the growth rate, crystallinity, light transmission and resistivity of ZnO:Si films. Methods Five samples with different thicknesses of ZnO:Si films were obtained on glass substrates by means of direct current magnetron sputtering system with different deposition time. Comparatively studies were carried out on growth orientations, structural characteristics, surface morphologies, electrical parameters and light transmission curves of these films. Results The results showed that all 5 samples were polycrystalline films with preferred orientation of (002) along the c-axis perpendicular to the substrate. When the film thickness increased from 207. 6 nm to 436. 1 nm, the grain size of films increased, the level of crystallinity increased, and the resistivity decreased, however, when the film thickness further increased from 436. 1 nm to 497. 8 nm, the degree of crystallization decreased and the resistivity increased. The average transmittance of all 5 samples was higher than 91. 7% in the visible light range. Conclusion Therefore, the film thickness strongly affected the electrical properties of ZnO:Si thin film, and had less impact on its optical transmittance.