目的 研究脉冲偏压占空比对 TiN / TiAlN 多层薄膜微观结构和硬度的影响规律。 方法 利用脉冲偏压电弧离子镀的方法,改变脉冲偏压占空比,在 M2 高速钢表面制备 5 种 TiN / TiAlN 多层薄膜,对比研究了薄膜的微观结构、元素成分、相结构和硬度的变化规律。 结果 TiN / TiAlN 多层薄膜表面出现了电弧离子镀制备薄膜的典型生长形貌,随着脉冲偏压占空比的增加,薄膜表面的大颗粒数目明显减少。 此外,脉冲偏压占空比的增加还引起多层薄膜中 Al / Ti 原子比的降低。 结论 TiN / TiAlN 多层薄膜主要以(111 ) 晶面择优取向生长,此外还含有(311 ) ,(222 ) 和(200 ) 晶相结构。 5 种多层薄膜的纳米硬度均在 33GPa 以上,当脉冲偏压占空比为 20% 时,可实现超硬薄膜的制备。

Objective To study the effects of pulsed bias duty cycle on the microstructure and hardness of TiN / TiAlN multilayer coatings. Methods Five TiN / TiAlN multilayer coatings with different pulsed bias duty cycle were deposited by the pulse biased arc ion plating method on M2 high speed steel substrates, and the microstructure, composition, phase structure and hardness of the multilayer coatings were investigated. Results TiN / TiAlN multilayer coatings surface exhibited a typical growth morphology prepared by arc ion plating. The amount of macroparticles was significantly reduced with increasing pulsed bias duty cycle. The increase of pulsed bias duty cycle also caused the decrease of Al / Ti atomic ratio in the multilayer coatings. Conlusion TiN / TiAlN multilayer coatings preferred (111) orientation growth, and meanwhile contained (311) , (222) and (200) crystallographic structure. The nanohardness of five multilayer coatings was higher than 33 GPa. At 20% pulsed bias duty cycle, the super hard coatings were prepared.