采用磁控溅射法,分别在铜基、铝基上制备 AlN / TiN_xO_y/ Al 多层膜,对比了该膜系与铜基和铝基的粘附性能,分析了与基底粘附性能的差异原因。 采用二次阳极氧化方法使铝基底表面形成多孔微结构,再次镀多层膜,表征了膜系的表面形貌、光谱吸收性能和反射率,研究了微结构对薄膜性能的影响。 结果表明:薄膜与铝基的粘附性较好,基底表面形成多孔微结构能有效提高其光谱吸收率。

The AlN / TiN_xO_y/ Al multilayers were deposited on Al substrate and Cu substrate by magnetron sputtering technology and the adhesion properties between the multilayers and two kinds of substrates were investigated respectively and the reasons of different adhesion of substrates were analyzed. Porous structures were made on the Al substrate by a two-step anodization method, and then the multilayers were deposited, and the surface morphology, the optical properties and the reflectance of the multilayers were tested. Then the influence of microstructure on the performance of solar absorbing films was studied. The results showed that the adhesion properties between the multilayers and Al substrate were better and porous structures could improve the absorptance of the solar selective absorbing films.