目的 针对传统石英玻璃表面加工方法效率低、表面质量差及材料去除率不足的问题,本研究旨在通过固结磁性磨料的集群磁性研磨加工方法,系统探究磁感应强度、进给速度、研磨头转速及研磨时间等关键工艺参数对材料去除率和表面粗糙度的影响规律,以实现加工效率与表面质量的综合优化。方法 试验以材料去除率和表面质量为核心评价指标,通过正交试验系统探究上述工艺参数对加工效果的影响规律,并采用灰色关联分析综合评估各参数对加工效果的影响。结果 影响材料去除率的各因素,其显著性排序为研磨时间>磁感应强度>研磨头转速>进给速度;影响工件表面粗糙度的各因素,其显著性排序为研磨时间>磁感应强度>进给速度>研磨头转速;灰色关联分析结果显示,综合考虑材料去除率和表面粗糙度后,最优综合工艺参数组合为研磨时间30 min、磁感应强度0.8 T、进给速度1 500 mm/min、研磨头转速1 000 r/min。此时材料去除率为0.762 μm/min,表面粗糙度Ra为6.84 nm。结论 进一步分析各参数作用机制发现,增大磁感应强度,既能提高材料去除率,又能有效降低表面粗糙度;适度提高进给速度对增大材料去除率、改善表面质量具有积极作用;过高的研磨头转速会导致材料去除率下降且表面质量恶化;研磨时间延长虽会使材料去除率略有降低,但可持续减小工件表面粗糙度。
Abstract
Aiming at the problems of low efficiency, poor surface quality and insufficient material removal rate of traditional quartz glass surface processing methods, this study aims to systematically explore the influence of key process parameters such as magnetic flux density, feed speed, lapping head speed, and lapping time on material removal rate and surface roughness through cluster magnetic abrasive lapping of consolidated magnetic abrasives, so as to realize the comprehensive optimization of processing efficiency and surface quality. In this study, fixed magnetic abrasives are used in the lapping process to reduce the splashing and loss of abrasives during the lapping process. A closed magnetic circuit is formed between the magnetic poles in the lapping area by using the cluster magnetic lapping head, which further improves the retention effect of the lapping head on the magnetic abrasive and the lapping uniformity of the workpiece, and reduces the scratch on the workpiece surface. The material removal rate and surface quality are used as the core evaluation indexes. The influence of four key process parameters, such as magnetic flux density, feed speed, lapping head speed and lapping time, on the processing effect is investigated through a orthogonal test system. The results show that: The significance of the factors affecting the material removal rate of the workpiece is: lapping time > magnetic flux density > lapping head speed > feed speed. The range analysis shows that the best combination of process parameters for material removal rate is A3B3C2D1, that is, the magnetic flux density is 0.8 T, the feed speed is 1 500 mm/min, the lapping head speed is 1 000 r/min, and the lapping time is 10 min. The significance of the factors affecting the surface roughness of the workpiece is: lapping time > magnetic flux density > feed speed > lapping head speed. The results of grey correlation analysis show that after considering the material removal rate and surface roughness, the optimal combination of comprehensive process parameters is lapping time of 30 min, magnetic flux density of 0.8 T, feed speed of 1 500 mm/min, and lapping head speed of 1 000 r/min. At this time, the material removal rate is 0.762 μm/min, and the surface roughness Ra is 6.84 nm. Further analysis of the mechanism of each parameter shows that the increase of magnetic flux density can simultaneously improve the material removal rate and reduce the surface roughness. Appropriately increasing the feed rate has a positive effect on increasing the material removal rate and improving the surface quality. Too high speed of lapping head will lead to the decrease of the material removal rate and the deterioration of surface quality. Although the prolonged lapping time will slightly reduce the material removal rate, it can continuously reduce the surface roughness of the workpiece. The results of this study can provide a theoretical basis and practical reference for the optimization of process parameters and high-efficiency and high-quality processing of quartz glass magnetic abrasive lapping.
关键词
石英玻璃 /
集群磁性研磨 /
材料去除率 /
表面粗糙度 /
磁感应强度 /
研磨头
Key words
quartz glass /
cluster magnetic abrasive lapping /
material removal rate /
surface roughness /
magnetic flux density /
lapping head
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基金
国家重点研发计划（2023YFE0204400）; 广东省普通高校特色创新类项目（2023KTSCX254）
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