目的 提升钛合金人工关节的表面质量与抛光效率。方法 将Halbach阵列磁场增强结构与类芬顿反应化学机制引入化学磁流变抛光工艺中,Halbach阵列能够产生更高强度、高梯度且空间分布更为均匀的磁场,从而显著增强磁流变抛光液的流变特性;而类芬顿反应则通过催化产生高活性羟基自由基,有效促进工件表面的微区化学蚀刻作用,实现化学研磨与机械抛光的协同增效。通过采用Box-Behnken实验设计与响应面分析法,系统研究了加工间隙、主轴转速和磨粒浓度3个关键工艺参数对表面粗糙度（Ra）和材料去除深度（DMR）的交互影响规律。结果 加工间隙是对抛光效果影响最显著的因子,其次为主轴转速和磨粒浓度。经多目标优化获得最优工艺参数组合为加工间隙0.6 mm、主轴转速436 rad/min、磨粒浓度9.6%（质量分数）。在该参数下进行验证试验,表面粗糙度Ra可达17 nm,材料去除深度达5.091 μm,与模型预测值误差小于11%,表明模型具有较高的可靠性。最终将优化工艺应用于钛合金人工髋关节球头实际抛光,经过1.5 h加工后,工件表面粗糙度由初始438 nm显著降低至18 nm。结论 优化得出的工艺参数不仅彻底去除了原始铣削纹路,而且实现了镜面级的表面质量,证实该工艺在钛合金人工关节高效高精度抛光方面具有重要的工程应用价值。
Abstract
The work aims to develop a novel chemical magnetorheological polishing (CMP) technique for high-performance finishing of Ti-6Al-4V artificial joints. The principal innovation is the synergistic coupling of a custom-designed annular Halbach array with an in-situ Fenton-like reaction system, a chemo-mechanical process that overcomes the intrinsic limitation of low material removal rates in conventional MR polishing.
The Halbach array generates a magnetic field with high intensity, high gradient, and exceptional uniformity, which induces the formation of a robust, stable chain-like "magnetic brush" in the MR fluid. This structure enhances abrasive particle control and mechanical polishing stability, while maintaining a constant shear force of approximately 0.8 MPa on the workpiece surface. Concurrently, a Fenton-like reaction is activated in the polishing zone: carbonyl iron powder (CIP) and deliberately added Fe3O4 in the MR fluid act as dual catalysts to decompose hydrogen peroxide (H2O2), generating highly reactive hydroxyl radicals (·OH). These OH radicals preferentially react with Al and V elements on the TC4 surface, reducing metallic bond energy and facilitating controlled etching to form a soft, non-metallic TiO2 layer which is then efficiently stripped by the mechanical shearing of abrasives. This real-time synergy between chemical softening and mechanical removal is the core mechanism enabling high-efficiency material removal.
A comprehensive experimental methodology based on the Response Surface Methodology (RSM) with a Box-Behnken Design (BBD) was employed to model and optimize the process. To eliminate interference from fluid composition, the MR fluid was fixed as 61.76wt.% CIP, 10.20wt.% Al2O3 abrasives, 0.81wt.% glycerol, 0.27wt.% cellulose, 0.11wt.% Fe3O4, and 26.85wt.% deionized water, with continuous supply of 0.4wt.% H2O2. Three critical process parameters (selected based on preliminary experiments to cover practical polishing ranges) were investigated, including working gap (0.6, 0.8, 1.0 mm), spindle speed (300, 400, 500 rad/min), and abrasive concentration (7wt.%, 10wt.%, 13wt.%). Surface roughness (Ra) and material removal depth (DMR) were set as response metrics.
RSM analysis produced highly significant regression models for both Ra (P=0.003 3, R2=92.65%) and DMR (P=0.027 3). The working gap was identified as the most dominant factor: a narrower gap (0.6 mm) amplified the Halbach array-induced magnetic field, directly reducing Ra and increasing DMR. Spindle speed was the second most significant factor, but a key finding was its non-monotonic effect, namely that the speed exceeding 400 rad/min induced centrifugal instability, degrading surface quality. A statistically significant interaction between spindle speed and abrasive concentration was also uncovered (P=0.028 4 for Ra). Additionally, abrasive concentration exhibited a distinct non-linear effect, with an optimal range around 10wt.% and concentrations above this led to excess free abrasives that disrupted polishing stability.
Multi-objective optimization determined the optimal parameter set: working gap=0.6 mm, spindle speed=436 rad/min, and abrasive concentration=9.6wt.%. Validation experiments under these conditions achieved Ra=17 nm (meeting the clinical standard of ≤20 nm for TC4 artificial joints) and DMR=5.091 μm. These values were in excellent agreement with model predictions (Rapredicted =15.5 nm, DMR,predicted= 4.594 μm), with relative errors of 9.7% (Ra) and 10.8% (DMR), both below 11%.
Final validation on a real TC4 prosthetic femoral head demonstrated practical efficacy. After a 1.5-hour polishing cycle, Ra was reduced from an initial 438 nm to 18 nm (over 95% improvement). Profilometric analysis confirmed complete elimination of original milling marks and formation of a uniform, mirror-like finish. This work conclusively demonstrates that the proposed CMP process of leveraging the synergy between Halbach array-enhanced magnetic fields and Fenton-like reactions is a highly effective, scalable solution for achieving superior surface integrity on complex-shaped titanium alloy biomedical implants.
关键词
磁流变抛光 /
响应面法 /
钛合金 /
人工关节球头 /
类芬顿 /
Halbach阵列
Key words
magnetorheological polishing /
response surface methodology /
titanium alloy /
artificial joint ball head /
Fenton-like Reaction /
Halbach Array
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基金
国家自然科学基金（面上52475446,海外2023）; 安徽省自然科学基金项目（面上2308085ME170）; 安徽省科技创新攻坚计划重大重点项目（202423i08050035）; 温州市重大科技创新攻关项目（ZG2022029）
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