目的 通过等离子体处理石墨膜，提高石墨膜表面的亲水性。方法 采用不同的工艺条件对石墨膜进行等离子体处理，测试石墨膜的表面接触角。利用扫描电子显微镜和原子力显微镜观察石墨膜处理前后表面形貌的变化，通过X射线光电子能谱分析石墨膜处理前后表面成分的变化。采用万能材料试验机测试镀铜样品的剥离强度，评价铜镀层与石墨膜的结合力。结果 采用空气处理气氛时，在气体流量为0.4 L/min、功率为60 W的条件下，处理30 s，石墨膜的接触角从处理前的93.41°降至4.49°；表面均方根粗糙度由952.10 pm提高到12.54 nm，最大高低差从10.81 nm升至72.70 nm。由X射线光电子能谱分析可知，石墨膜经等离子体处理后，碳元素的原子数分数由未处理的98.37%下降到83.13%，氧元素的原子数分数由未处理的1.63%升高到16.87%，氧碳含量比则由起初的1.66%升高到20.29%。结论 石墨膜经等离子体处理后，表面被刻蚀并且引入含氧极性基团，等离子体处理显著提高了石墨膜表面的亲水性。

the work aims to improve the surface hydrophilicity of graphite film by plasma treatment on graphite film. Using different process conditions on the graphite film surface treatment, test the contact angle of the graphite film; surface morphology of the sample before and after plasma treatment was observed by scanning electron microscopy and atomic force microscopy; by X-ray photoelectron spectroscopy analysis of the surface composition changes before and after; by universal material testing machine measured the peel strength of copper plating samples, and the adhesion between copper layer and graphite film was evaluated. When air was used as the treatment atmosphere, 30 s was treated under the condition of 60 W and 0.4 L/min power,the contact angle of graphite film reduced from 93.41° to 4.49° and the surface RMS roughness of graphite film surface amouted from 952.10 pm to 12.54 nm, Maximum height difference rises from 10.81 nm to 72.70 nm. XPS analysis shows that the content of carbon decreased from 98.37% to 83.13%, and the oxygen content increased from 1.63% to 16.87%, while the content of oxygen and carbon increased from 1.66% to 20.29%. After the graphite film was treated by plasma, the surface was etched and the polar group containing oxygen was introduced. The hydrophilicity of the graphite film was improved remarkably.