Objective To improve the electroforming uniformity of double micro gear die cavity inserts in the process of electroforming. Methods First of all, the electric field intensity distribution on the double micro gear cavity inserts in the electroforming process was simulated with Ansys, and the method of applying insulating baffle was proved to be feasible. Second, the effects of insulating baffle geometry and position size on the electric field intensity was investigated using the orthogonal experiment method. Finally, the application of grey theory was used in finding the optimal combination of process parameters. Results Ansys simulation results showed that the application of insulating baffle under certain conditions could increase the uniformity and evenness of the thickness of photoresist electroforming layer. The relative error of path a was reduced from 62. 48% to 33. 18% . The relative error of path b was reduced from 48. 01% to 8. 91% . Conclusion By applying insulating baffle, the uniformity of the cast layer was improved during the electroforming process of double micro gear die cavity inserts.