Non-contact and Continuous Electrochemical Polishing of the Metal Strip

CHENG Hao, CAI Yuan, YANG Shu-ping, ZHUANG Wei-wei, ZHANG Guo-dong, GAO Yong-chao

Surface Technology ›› 2014, Vol. 43 ›› Issue (2) : 105-108,155.

PDF(4359 KB)
PDF(4359 KB)
Surface Technology ›› 2014, Vol. 43 ›› Issue (2) : 105-108,155.
Applied Technology

Non-contact and Continuous Electrochemical Polishing of the Metal Strip

  • CHENG Hao, CAI Yuan, YANG Shu-ping, ZHUANG Wei-wei, ZHANG Guo-dong, GAO Yong-chao
Author information +
History +

Abstract

Objective To develop a non-contact electrochemical polishing method which is suitable for producing continuous metal strip in industry. Methods Using environment friendly phosphoric acid-sulfuric acid as the main antioxidant electrochemical polishing solution, the influences of the anodic current density ( JA ) , the electrolyte temperature ( t ) , the distance between electrodes and metal strip( L) , the tape speed( v) on the surface roughness of the metal strip were studied, and the polishing process conditions were optimized. Results The optimized process conditions are as following: JA : 1500 ~ 2500 A / m2, t: 40 ~ 80 ℃ , L: 4 ~ 12 mm, v: 0. 5 ~ 1. 8 m / min. The results showed that the electrochemical polishing process could effectively reduce the surface roughness of the metal strip under the optimized conditions,the brightness of the polished tape could reach the mirror state, the average surface roughness Ra value was less than 1. 0 nm as tested by AFM around the 5 μmX5 μm micron. Conclusion The polishing process achieved the continuous polishing of metal strip at kilometer level and met the requirements for industrial production.

Key words

non-contact; electrochemical polishing; process conditions; average roughnes

Cite this article

Download Citations
CHENG Hao, CAI Yuan, YANG Shu-ping, ZHUANG Wei-wei, ZHANG Guo-dong, GAO Yong-chao. Non-contact and Continuous Electrochemical Polishing of the Metal Strip[J]. Surface Technology. 2014, 43(2): 105-108,155
PDF(4359 KB)

Accesses

Citation

Detail

Sections
Recommended

/