Application of X-ray Photoelectron Spectroscopy in Material Surface Research

FENG Ting, 作者英文名, YU Jin-tao, GUO Zhan-cheng

Surface Technology ›› 2014, Vol. 43 ›› Issue (1) : 119-124.

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Surface Technology ›› 2014, Vol. 43 ›› Issue (1) : 119-124.
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Application of X-ray Photoelectron Spectroscopy in Material Surface Research

  • FENG Ting1, 作者英文名2, YU Jin-tao2, GUO Zhan-cheng2
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Abstract

This paper briefly reviewed the principle and characteristics of XPS in surface analysis, and described its specific application in material research. The position, shape and intensity of XPS peaks can be used for determining the chemical valence and content of elements. Ultrathin sample can be analyzed by the angle-resolved XPS method. Imaging XPS could show the distribution of element on the surface of samples and its chemical valence. Through depth profiling using argon-ion etching, the variation of sample chemical state with depth can be revealed.

Key words

X-ray photoelectron spectroscopy( XPS) ; surface analysis; material research

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FENG Ting, 作者英文名, YU Jin-tao, GUO Zhan-cheng. Application of X-ray Photoelectron Spectroscopy in Material Surface Research[J]. Surface Technology. 2014, 43(1): 119-124

Funding

Supported by the National High Technology Research and Development Program of China (863 Program, 2011AA06A105)
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