Pseudoelasticity Behavior of Ti-Ni Alloy Film Deposited Using Unbalanced Magnetron Sputtering

XU Xue-bo, HE Yao-hua, HE Zhi-yong, BAO Ming-dong

Surface Technology ›› 2013, Vol. 42 ›› Issue (4) : 28-31.

PDF(2890 KB)
PDF(2890 KB)
Surface Technology ›› 2013, Vol. 42 ›› Issue (4) : 28-31.

Pseudoelasticity Behavior of Ti-Ni Alloy Film Deposited Using Unbalanced Magnetron Sputtering

  • XU Xue-bo1, BAO Ming-dong1, HE Yao-hua2, HE Zhi-yong3
Author information +
History +

Abstract

Five Ti-Ni shape memory alloy films with different composition were deposited using unbalanced magnetron sputter ion plating technique. As-deposited coatings were crystallized by heating to 600 益 at the environment of Ar insert gas.The phase transformation behavior of the fabricated film was investigated. The hardness and Young modulus of films were evaluated. The recoverable energy of films was investigated from the entire loading and unloading process that results into a load-displacement curve automatically. The effect of composition of films on hardness, elastic modulus and pseudoelasticity was discussed. Results indicated that hardness, Young爷 s modulus and pseudoelasticity increased with the rising of atomic percent of Ni in films. But there was a maximum value of those mechanic properties with the increase of Ni percent .

Key words

shape memory alloys; thin film; nanoindentation; pseudoelasticity

Cite this article

Download Citations
XU Xue-bo, HE Yao-hua, HE Zhi-yong, BAO Ming-dong. Pseudoelasticity Behavior of Ti-Ni Alloy Film Deposited Using Unbalanced Magnetron Sputtering[J]. Surface Technology. 2013, 42(4): 28-31
PDF(2890 KB)

Accesses

Citation

Detail

Sections
Recommended

/