Study on Chemical Vapor Deposition Process for TiB2Coating

LI Li, WU Hu-lin, SUN Cai-yun, HE Qing-bing, ZHANG Long-ping, YI Tong-bin

Surface Technology ›› 2013, Vol. 42 ›› Issue (1) : 81-84.

PDF(4922 KB)
PDF(4922 KB)
Surface Technology ›› 2013, Vol. 42 ›› Issue (1) : 81-84.
Research and Exploration

Study on Chemical Vapor Deposition Process for TiB2Coating

  • LI Li, WU Hu-lin, SUN Cai-yun, HE Qing-bing, ZHANG Long-ping, YI Tong-bin
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Abstract

Titanium diboride ( TiB2) coating was successfully deposited on low carbon steel and graphite substrate respectively depending on TiCl4-BCl3-H2reactive system by chemical vapor deposition technology. The effect of deposition temperature , gas flow rate and substrate material on microstructure and microhardness of TiB2coating was researched. The result shows that , TiB2coating, which was deposited on low carbon steel substrate, exhibit random grains and better crystallization at higher temperature, columnar grains at lower temperature and lower BCl3gas flow rate characterized by XRD patterns and SEM observation . Microhardness test indicates that the microhardness value of TiB2coating of random grain is higher than that of oriented columnar grains. The substrate material affects the deposition rate of TiB2coating strongly. Deposited 1 h at 100 mL / min BCl3and 980 ℃ , the thickness of TiB2coating attains 44 μm ~ 70 μm at graphite surface whereas 20 μm at low carbon steel .

Key words

TiB2coating; microstructure; deposition rate

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LI Li, WU Hu-lin, SUN Cai-yun, HE Qing-bing, ZHANG Long-ping, YI Tong-bin. Study on Chemical Vapor Deposition Process for TiB2Coating[J]. Surface Technology. 2013, 42(1): 81-84
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