Influence of the Base Pressure on AZO Film Deposited by Magnetron Sputter Method

HUO Hong-ying, CHANG Hui, ZOU Min, MA Guang-qiang

Surface Technology ›› 2013, Vol. 42 ›› Issue (1) : 75-77.

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PDF(2218 KB)
Surface Technology ›› 2013, Vol. 42 ›› Issue (1) : 75-77.
Research and Exploration

Influence of the Base Pressure on AZO Film Deposited by Magnetron Sputter Method

  • HUO Hong-ying, CHANG Hui, ZOU Min, MA Guang-qiang
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Abstract

A AZO film was deposited on the top of flat glass with DC magnetron sputtering technology. The influence of base pressure on the film thickness,square resistance, transmissivity in 300 ~ 1100 nm wavelength was studied. The experimental results show that AZO film’s square resistance and transmissivity have a decline trend, but the thickness become thinner with the increase of base pressure. When the base pressure is in low level, the square resistance, transmissivity and thickness of AZO film are influenced conspicuously by base pressure. These influences will decline if continue to increase the base pressure.

Key words

magnetron sputter; AZO film; base pressure

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HUO Hong-ying, CHANG Hui, ZOU Min, MA Guang-qiang. Influence of the Base Pressure on AZO Film Deposited by Magnetron Sputter Method[J]. Surface Technology. 2013, 42(1): 75-77
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