Al thin films were respectively deposited by DC magnetron sputtering on the flexible substrates, such as the polyester , the aramid and the cotton etc. The deposition rate, structure and surface morphology of the aluminum thin films were studied. The results show that the deposition rate increases almost linearly with increasing sputtering power in a certain range. On the other hand, the deposition rate increases with increasing working pressure then decreases when it came up to the maximum peak. The crystal structures of the films are influenced due to the different substrates. The films on the polyester and cotton only have typical polycrystalline face-centered cubic structure. The films on the aramid and polyester are more uniform density and the particles are smaller than the ones on the cotton. Within a certain range, the increase of the sputtering power does enhance the quality of the thin films.