Influence of Janus Green and Its Compound Additives on Microstructure and Properties of Electrolytic Copper Foil

LIU Jialiang, LI Yongle, LIAO Jiena, ZHANG Yunpeng, LIU Jun, HUANG Jian, QI Liang, YANG Hongguang, QI Sujie, FAN Xiaowei

Surface Technology ›› 2026, Vol. 55 ›› Issue (14) : 224-233.

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Surface Technology ›› 2026, Vol. 55 ›› Issue (14) : 224-233. DOI: 10.16490/j.cnki.issn.1001-3660.2026.14.020
Functional Surfaces and Technology

Influence of Janus Green and Its Compound Additives on Microstructure and Properties of Electrolytic Copper Foil

  • LIU Jialiang1a,1b,2, LI Yongle1a,1b, LIAO Jiena1a,1b, ZHANG Yunpeng1a,1b,2, LIU Jun1a,1b,2, HUANG Jian1a,2, QI Liang1c,2, YANG Hongguang3, QI Sujie3, FAN Xiaowei1a,1b,2,*
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Abstract

Copper foil is a conductor material for the negative electrode current collector of lithium batteries. Its mechanical properties and surface quality are directly affected by the additives in the electrolyte. A complex additive system containing Janus green is developed. Low-profile lithium battery copper foils are prepared by direct current electroplating, and the tensile strength is enhanced to meet the high mechanical property requirements of lithium batteries. The experiment studies the microstructure of copper foils electrodeposited with Janus green (JGB) through Molecular energy level calculation, LSV, SEM, CLSM, XRD, EBSD analysis and mechanical tensile tests. The depolarization of single JGB transforms into polarization with adding Cl-, which is manifested by the initial deposition potential shifting from -0.22 V to -0.25 V negatively, and the overpotential increases by 0.03 V. Through density functional theory (DFT) calculation, the LUMO energy level of JGB is mainly distributed on the N atom and the N atom connected to the benzene ring, making these regions the preferred sites for electrophilic reactions. The HOMO energy level is concentrated on the N and C atoms coordinated with Cl-, indicating that this area is the preferred site for nucleophilic reactions and is prone to preferential adsorption. Due to the small energy level difference ΔE (1.14 eV) of JGB, the electronic structure is more prone to orbital interaction, demonstrating a stronger ability for strong coordination and interface adsorption. It hinders the reduction of Cu2+ and thereby suppresses the rapid deposition of copper. Adding 1 mg/L of JGB reduces the surface roughness of the electrodeposition copper foils to as low as 1.25 μm, and the texture Tc with diffraction peaks showing a preferred orientation of the crystal plane (220) is 81.10%. Adding thiourea (TU), the initial deposition potential further shifts negatively to -0.27 V. The overpotential increases by 0.02 V, which is less than the influence of JGB. Because the energy level difference ΔE of TU is as large as 6.02 eV. Meanwhile, the LUMO energy levels of TU are uniformly distributed across the molecule, while the HOMO energy levels are mainly concentrated on the S atom. The sulfur atom in the thiourea molecule has lone pairs of electrons, which preferentially adsorb at the high-energy active sites on the copper deposition surface, inhibiting the rapid growth of the deposited grains. So the added thiourea (TU) molecule which containing —NH2 and C==S groups, coordinates with Cu2+, and generates an electrochemical antagonistic synergistic effect with JGB, and both the additives enhance cathodic polarization. The result is promoting a smooth surface of the deposition, and reducing the roughness. Compared with the large grain size of 0.97 μm in the base solution (VMS) that only contains Cl-, the electrocrystallization crystal structure of plating solution containing additives transforms into a dense crystal plane (111) with directional growth, and forms a fine-grained strengthening mechanism. Finally, the VMS+Cl-+JGB+TU system is implemented to obtain high-performance copper foils, which include a roughness of 1.17 μm, a grain size of 0.56 μm, a tensile strength of 607 MPa, and an elongation of 2.1%.

Key words

additive / cathodic polarization / crystal plane orientation / roughness / tensile strength

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LIU Jialiang, LI Yongle, LIAO Jiena, ZHANG Yunpeng, LIU Jun, HUANG Jian, QI Liang, YANG Hongguang, QI Sujie, FAN Xiaowei. Influence of Janus Green and Its Compound Additives on Microstructure and Properties of Electrolytic Copper Foil[J]. Surface Technology. 2026, 55(14): 224-233

References

[1] 孙玥, 刘玲玲,李鑫泉, 等. 添加剂对电解铜箔作用机理及作用效果的研究进展[J]. 化工进展, 2021, 40(11): : 5861-5874.
SUN Y, LIU L L, LI X Q, et al.Research Progress in Mechanisms and Effects of Various Additives Used for Preparing Electrolytic Copper Foils[J]. Chemical Industry and Engineering Progress, 2021, 40(11): 5861-5874.
[2] XIA T T, LIANG T X, XIAO Z E, et al.Nanograined Copper Foil as a High-Performance Collector for Lithium- Ion Batteries[J]. Journal of Alloys and Compounds, 2020, 831: 154801.
[3] HUANG L Y, WANG X, YIN F X, et al.ZnO Nanorods Grown Directly on Copper Foil Substrate as a Binder- Free Anode for High Performance Lithium-Ion Batteries[J]. International Journal of Electrochemical Science, 2016, 11(10): 8439-8446.
[4] HUANG J, LIU W F, CHEN M W, et al.Electrodeposition of 15 μm Nanotwinned Cu Foils with Low Warpage and Excellent Mechanical Properties[J]. Journal of Alloys and Compounds, 2025, 1010: 178156.
[5] LEE H, MA M D.Blockchain-Based Mobility Management for 5G[J]. Future Generation Computer Systems, 2020, 110: 638-646.
[6] ZHOU G Y, TAO Y P, HE W, et al.Whisker Inhibited Sn-Bi Alloy Coating on Copper Surface to Increase Copper Bonding Strength for Signal Loss Reduction of PCB in High-Frequency[J]. Applied Surface Science, 2020, 513: 145718.
[7] WANG L J, FA X W, TANG Y Z, et al.Preparation of an Ultra-Low Profile and High Peel Strength Copper Foil with Rice-Grain Microstructures[J]. Materials Advances, 2023, 4(24): 6621-6626.
[8] 王丽娟, 廖娟, 宋宁, 等. 脉冲法制备低轮廓微纳表面结构电子铜箔[J]. 表面技术, 2024, 53(22): 202-209.
WANG L J, LIAO J, SONG N, et al.Preparation of Electronic Copper Foils with Low-Profile and Micro- Nano Surface Structures by Pulsed Method[J]. Surface Technology, 2024, 53(22): 202-209.
[9] LU L L, LIU H T, WANG Z D, et al.Advances in Electrolytic Copper Foils: Fabrication, Microstructure, and Mechanical Properties[J]. Rare Metals, 2025, 44(2): 757-792.
[10] 师慧娟, 陆冰沪, 樊小伟, 等. 电解铜箔表面处理技术及添加剂研究进展[J]. 中国有色金属学报, 2021, 31(5): 1270-1284.
SHI H J, LU B H, FAN X W, et al.Research Progress of Electrolytic Copper Foil Surface Treatment Technology and Additives[J]. The Chinese Journal of Nonferrous Metals, 2021, 31(5): 1270-1284.
[11] SONG N, LIU W F, WANG L J, et al.Preparation of Nano Twin Copper Foil with High Elongation and Excellent Suppression Self-Annealing via Pulse Superposition Direct Current Method[J]. Materials Characterization, 2024, 215: 114187.
[12] JO Y E, YU D Y, CHO S K.Revealing the Inhibition Effect of Quaternary Ammonium Cations on Cu Electrodeposition[J]. Journal of Applied Electrochemistry, 2020, 50(2): 245-253.
[13] LAI Z Q, WANG S X, WANG C, et al.A Comparison of Typical Additives for Copper Electroplating Based on Theoretical Computation[J]. Computational Materials Science, 2018, 147: 95-102.
[14] LIAO J, WANG L J, SONG N, et al.Preparation, Micro- Structure and Characterization of High Strength and Low Profile Lithium Copper Foil with SPS and HP Additives[J]. Materials Science and Engineering: B, 2024, 299: 116969.
[15] 刘伟, 刘怡, 吴忠. 添加剂极性对电镀铜结构及力学性能的影响[J]. 表面技术, 2025, 54(4): 211-220.
LIU W, LIU Y, WU Z.Effect of Additive Polarity on Structural and Mechanical Properties of Electroplated Copper[J]. Surface Technology, 2025, 54(4): 211-220.
[16] 黄剑, 刘伟飞, 宋宁, 等. 胶原蛋白及自退火行为对电解铜箔翘曲性能的影响[J]. 铜业工程, 2024(3): 145-151.
HUANG J, LIU W F, SONG N, et al.Warpage of Electrolytic Copper Foil with Collagen and Self Annealing Behavior[J]. Copper Engineering, 2024(3): 145-151.
[17] LI Z, TAN B Z, LUO J Y, et al.Structural Influence of Nitrogen-Containing Groups on Triphenylmethane-Based Levelers in Super-Conformal Copper Electroplating[J]. Electrochimica Acta, 2022, 401: 13944.
[18] 吴敏娴, 张然, 明智耀, 等. 硫脲对复合添加剂体系电解制备超低轮廓电解铜箔性能的影响[J]. 电镀与精饰, 2025, 47(3): 77-82.
WU M X, ZHANG R, MING Z Y, et al.Effect of Thiourea on the Performance of Ultra-Low Profile Electrolytic Copper Foil[J]. Plating & Finishing, 2025, 47(3): 77-82.
[19] PENG X S, LI L C, JIANG J, et al.Mechanistic Insight into the Janus Green B on Electrochemical Roughening Layer of Copper Foil[J]. Colloids and Surfaces A: Physicochemical and Engineering Aspects, 2024, 698: 134523.
[20] WOO T G, PARK I S.Main Effects of Additives on Copper Electroplating at High Current Density[J]. Korean Journal of Materials Research, 2025, 35(5): 182-190.
[21] WOO T G, PARK I S.Changes in Electrical Properties of Copper-Plated Layer by Organic Additives on High Current Density[J]. Korean Journal of Metals and Materials, 2020, 58(1): 41-48.
[22] 陈杨, 杜荣斌, 朱旭, 等. 染料JGB的镀铜机制及其对电解铜箔微观形貌和力学性能的影响[J]. 工业技术创新, 2023, 10(5): 93-98.
CHEN Y, DU R B, ZHU X, et al.Copper Plating Mechanism of Dye JGB and Its Effect on Microstructure and Mechanical Properties of Electrolytic Copper Foil[J]. Industrial Technology Innovation, 2023, 10(5): 93-98.
[23] ZHANG Y M, HANG T, DONG M Y, et al.Effects of 2-Mercaptopyridine and Janus Green B as Levelers on Electrical Resistance of Electrodeposited Copper Thin Film for Interconnects[J]. Thin Solid Films, 2019, 677: 39-44.
[24] BRAGA L S, LEAL D H S, KUCA K, et al. Perspectives on the Role of the Frontier Effective-for-Reaction Molecular Orbital (FERMO) in the Study of Chemical Reactivity: An Updated Review[J]. Current Organic Chemistry, 2020, 24(3): 314-331.
[25] KUMAR D, JAIN N, JAIN V, et al.Amino Acids as Copper Corrosion Inhibitors: A Density Functional Theory Approach[J]. Applied Surface Science, 2020, 514: 145905.
[26] LI Y B, WANG W, LI Y L.Adsorption Behavior and Related Mechanism of Janus Green B during Copper Via-Filling Process[J]. Journal of The Electrochemical Society, 2009, 156(4): 119-124.
[27] MASANORI H, MUNEMASA T, KOJI A, et al.Copper Bottom-up Deposition by Breakdown of PEG-Cl Inhibition[J]. Electrochemical and Solid-State Letters, 2002, 5(10): 98-101.
[28] XU P, LU W W, SONG K X, et al.Preparation of Electrodeposited Copper Foils with Ultrahigh Tensile Strength and Elongation: A Functionalized Ionic Liquid as the Unique Additive[J]. Chemical Engineering Journal, 2024, 484: 149557.
[29] TANAKA K, TAKESHITA S, OTSUKA K, et al.Grain- Size Effect on Fatigue Properties of Copper Thin Films Produced by Electrodeposition[J]. Journal of the Society of Materials Science, Japan, 2015, 64(11): 918-925.
[30] VASZILCSIN N, BUND A, KRAWCZYK H W.Adsorption Behavior of Thiourea and Its Derivatives on Copper Surfaces: A Combined Experimental and DFT Study[J]. Electrochimica Acta, 2012, 69: 158-164.
[31] MAGNUSSEN O M, OCKO B M, TADJEDDINE A.In situ STM Study of Thiourea Adsorption on Cu(111): Role of Sulfurlone Pairs in Surface Confinement[J]. Journal of Physical Chemistry B, 2003, 107(6): 1365-1372.

Funding

Key Research and Development project of Jiangxi Province (20244BBG7300, 20244BDD40005, 20252BCE310021); Key Research and Development of Gannan Laboratory (2025GNZD002); Key Research and Development of Jiujiang (ZD2025001437)
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