Influence of Carbon Sources on Growth of Diamond Films by Chemical Vapor Deposition: From C&#x02014;H&#x02014;O Phase Diagram to Property Regulation

LI Chengming; ZOU Zongquan; REN Feitong; SONG Zhiqiang; CHEN Liangxian; WEI Junjun; LIU Jinlong

doi:10.16490/j.cnki.issn.1001-3660.2026.08.015

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Surface Technology ›› 2026, Vol. 55 ›› Issue (8) : 186-196. DOI: 10.16490/j.cnki.issn.1001-3660.2026.08.015

Influence of Carbon Sources on Growth of Diamond Films by Chemical Vapor Deposition: From C—H—O Phase Diagram to Property Regulation

LI Chengming^1,2,*, ZOU Zongquan^1,2, REN Feitong¹, SONG Zhiqiang^1,2, CHEN Liangxian^1,*, WEI Junjun^1,2, LIU Jinlong^1,2

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Abstract

Chemical vapor deposition (CVD) diamond has emerged as a focal point in materials science research due to its exceptional physical and chemical properties, which include extreme hardness, high thermal conductivity, wide bandgap, and excellent chemical inertness. Consequently, it exhibits immense application potential not only in traditional mechanical fields but also in advanced thermal management, as well as in the rapidly developing microelectronics and optoelectronics sectors. However, a critical bottleneck in CVD technology remains. There is an inherent trade-off between the growth rate of diamond films and their crystal quality. Achieving a synergistic optimization of these two parameters is recognized as a major challenge. Within the C—H—O reaction system, the selection of carbon sources serves as the core regulatory factor and is considered the key to resolving this challenge.
This paper provides a comprehensive review of the influence mechanisms and recent research progress regarding carbon sources in the growth of CVD diamond films. Initially, the theoretical foundation of the C—H—O ternary phase diagram is established to delineate the thermodynamic boundaries for diamond deposition. Subsequently, the principles, advantages, and limitations of mainstream CVD techniques, including Hot Filament Chemical Vapor Deposition (HFCVD), Microwave Plasma Chemical Vapor Deposition (MPCVD), and Radio Frequency Plasma Chemical Vapor Deposition (RFCVD), are systematically introduced and compared. By integrating the pyrolysis mechanisms of carbon sources with the C—H—O phase diagram, the ways in which different carbon sources (such as methane, ethanol, and acetone) modulate the gas-phase chemical environment are elucidated. It is noted that the specific elemental compositions (C, H, O) of these precursors play a distinct role in the generation of active radicals, thereby fundamentally influencing the nucleation density and subsequent growth processes of the diamond.
Furthermore, the deposition behaviors of various carbon sources, specifically methane, ethanol, acetone, and methanol, are comparatively analyzed under typical CVD process conditions. Emphasis is placed on the comparative evaluation of the growth rate, crystal quality, defect density, and surface morphology. The results indicate significant differences in film characteristics. In terms of grain size, films deposited with methane are characterized by the finest grains, whereas those deposited with ethanol exhibit the coarsest grain structure. Regarding the growth rate, oxygen-containing carbon sources such as ethanol and acetone demonstrate a marked advantage over pure hydrocarbons, which is attributed to the etching effect of oxygen species on non-diamond carbon and the enhancement of active radical concentration. Moreover, variations in crystallographic orientation are observed; the difference in oxygen content among the carbon sources is found to promote the growth of the (100) crystal face. This variation in preferred orientation subsequently leads to distinctions in mechanical properties, such as fracture strength and wear resistance. It is emphasized that there is no absolute superiority among different carbon sources; rather, a balance between "high quality" and "high growth rate" must be struck according to the specific application requirements.
Finally, based on a synthesis of existing research, strategies for carbon source selection and process optimization are proposed, tailored for distinct application scenarios such as optical windows, heat sinks, and electronic devices. This review not only provides a systematic perspective for deepening the understanding of carbon source mechanisms in CVD diamond growth but also offers valuable theoretical references and practical guidance for researchers and engineers aiming to optimize deposition processes and develop high-performance diamond films.

Key words

C—H—O system / diamond film / carbon source / CVD / properties

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LI Chengming, ZOU Zongquan, REN Feitong, SONG Zhiqiang, CHEN Liangxian, WEI Junjun, LIU Jinlong. Influence of Carbon Sources on Growth of Diamond Films by Chemical Vapor Deposition: From C—H—O Phase Diagram to Property Regulation[J]. Surface Technology. 2026, 55(8): 186-196

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Funding

National Natural Science Foundation of China (U2441264); Supported by State Key Lab of Advanced Metal and Materials（2025-Z27）; Project of National Excellent Engineers Innovation Institute of Guangdong-Hong Kong-Macao Greater Bay Area(Foshan) Advanced Manufacturing Industry (JBGS2025005)