Cluster Magnetic Abrasive Lapping of Quartz Glass Based on Fixed Magnetic Abrasive

QIU Tengxiong; LIN Junqiang; QIU Yongliang; YAN Qiusheng

doi:10.16490/j.cnki.issn.1001-3660.2026.07.005

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Surface Technology ›› 2026, Vol. 55 ›› Issue (7) : 47-57. DOI: 10.16490/j.cnki.issn.1001-3660.2026.07.005

Precision and Ultra-precision Machining

Cluster Magnetic Abrasive Lapping of Quartz Glass Based on Fixed Magnetic Abrasive

QIU Tengxiong¹, LIN Junqiang², QIU Yongliang¹, YAN Qiusheng²

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Abstract

Aiming at the problems of low efficiency, poor surface quality and insufficient material removal rate of traditional quartz glass surface processing methods, this study aims to systematically explore the influence of key process parameters such as magnetic flux density, feed speed, lapping head speed, and lapping time on material removal rate and surface roughness through cluster magnetic abrasive lapping of consolidated magnetic abrasives, so as to realize the comprehensive optimization of processing efficiency and surface quality. In this study, fixed magnetic abrasives are used in the lapping process to reduce the splashing and loss of abrasives during the lapping process. A closed magnetic circuit is formed between the magnetic poles in the lapping area by using the cluster magnetic lapping head, which further improves the retention effect of the lapping head on the magnetic abrasive and the lapping uniformity of the workpiece, and reduces the scratch on the workpiece surface. The material removal rate and surface quality are used as the core evaluation indexes. The influence of four key process parameters, such as magnetic flux density, feed speed, lapping head speed and lapping time, on the processing effect is investigated through a orthogonal test system. The results show that: The significance of the factors affecting the material removal rate of the workpiece is: lapping time > magnetic flux density > lapping head speed > feed speed. The range analysis shows that the best combination of process parameters for material removal rate is A₃B₃C₂D₁, that is, the magnetic flux density is 0.8 T, the feed speed is 1 500 mm/min, the lapping head speed is 1 000 r/min, and the lapping time is 10 min. The significance of the factors affecting the surface roughness of the workpiece is: lapping time > magnetic flux density > feed speed > lapping head speed. The results of grey correlation analysis show that after considering the material removal rate and surface roughness, the optimal combination of comprehensive process parameters is lapping time of 30 min, magnetic flux density of 0.8 T, feed speed of 1 500 mm/min, and lapping head speed of 1 000 r/min. At this time, the material removal rate is 0.762 μm/min, and the surface roughness Ra is 6.84 nm. Further analysis of the mechanism of each parameter shows that the increase of magnetic flux density can simultaneously improve the material removal rate and reduce the surface roughness. Appropriately increasing the feed rate has a positive effect on increasing the material removal rate and improving the surface quality. Too high speed of lapping head will lead to the decrease of the material removal rate and the deterioration of surface quality. Although the prolonged lapping time will slightly reduce the material removal rate, it can continuously reduce the surface roughness of the workpiece. The results of this study can provide a theoretical basis and practical reference for the optimization of process parameters and high-efficiency and high-quality processing of quartz glass magnetic abrasive lapping.

Key words

quartz glass / cluster magnetic abrasive lapping / material removal rate / surface roughness / magnetic flux density / lapping head

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QIU Tengxiong, LIN Junqiang, QIU Yongliang, YAN Qiusheng. Cluster Magnetic Abrasive Lapping of Quartz Glass Based on Fixed Magnetic Abrasive[J]. Surface Technology. 2026, 55(7): 47-57

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