Abrasives mainly play a mechanical role in polishing solution. The physical and chemical properties of abrasives, such as hardness, particle size and concentration, are critical factors affecting the performance of CMP and have a greater impact on polishing efficiency. Whereas China has dependence and high demand on foreign polishing solution, and indicators including the accuracy fail to meet the market requirements, and at the same time, because the abrasives plays a vital role in the polishing performance of polishing solution, it is imperative to find better modified abrasives or new abrasive materials to promote the development of chemical mechanical polishing technology.