Magnetic Field Simulation and Structure Design of Cylindrical Magnetron Sputtering Target

WANG Dong, CAI Chang-long, MI Qian, WANG Lin-bo, LIU Hua-chen, HOU Jie

Surface Technology ›› 2023, Vol. 52 ›› Issue (8) : 371-379.

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Surface Technology ›› 2023, Vol. 52 ›› Issue (8) : 371-379. DOI: 10.16490/j.cnki.issn.1001-3660.2023.08.032

Magnetic Field Simulation and Structure Design of Cylindrical Magnetron Sputtering Target

  • WANG Dong, CAI Chang-long, MI Qian, WANG Lin-bo, LIU Hua-chen, HOU Jie
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Abstract

In order to explore the possibility of a device which can be used to coat the outer surface of cylindrical workpiece, a new type of cylindrical magnetron sputtering target is designed. Sputtering takes place on the inner surface of the cylindrical target, and the outer surface of the workpiece is coated from all sides to improve the large volume and complex structure of the traditional coating device for long tube workpiece. Firstly, the initial structure of the cylindrical magnetron sputtering target was designed, and then the magnetostatic non-current simulation module in the finite element analysis software

Key words

magnetron sputtering target; magnetic field simulation; finite element analysis; optimization; structural design; cylindrical type

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WANG Dong, CAI Chang-long, MI Qian, WANG Lin-bo, LIU Hua-chen, HOU Jie. Magnetic Field Simulation and Structure Design of Cylindrical Magnetron Sputtering Target[J]. Surface Technology. 2023, 52(8): 371-379
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