As a physical vapor deposition method, magnetron sputtering technology can improve the surface performance of matrix without changing the substrate material. Besides, the deposition rate of the magnetron sputtering becomes faster and the film prepared by magnetron sputtering is uniformly dense and has high adhesion force. In this paper, reaction magnetron sputtering technology were used to prepare a series of (WMoTaNb)ZrxN films by changing Zr target power and this paper aimed to study the effect of Zr target power on the microstructure and performance of (WMoTaNb)ZrxN films.