This paper aims to study the effects of the parameters of ion cleaning activation and DC magnetron sputtering on properties of polyimide-aluminum films. The effects of plasma activation process parameters (power of ion source, flow rate of cleaning gas, speed of belt) and magnetron sputtering parameters (power of sputtering, flow rate of sputtering gas, temperature of coating roller, belt speed and stress) on the solar absorptivity, adhesion and appearance of film have been studied to determine the optimal process parameters. The morphology, transmittance and electromagnetic signal attenuation frequency of the film are measured by the scanning electron microscopy, optical instruments and electromagnetic signal testing equipment. The results show that when the ion source power is 1260 W, the gas flow rate is 120 mL/min, the belt speed is 0.3 m/min, the temperature of the coating roller is 10 ℃, and the sputtering power is 10 000 W, the minimum solar absorptivity of the prepared PI-aluminum film is 0.09, the adhesion of the film is strong, the abnormal discharge phenomenon is the least, and the surface is smooth. The film transmittance is less than 3.5% in band range of 0.4~14 μm, the electromagnetic signal attenuation rate of film is more than 30 dB in the 3~15 GHz frequency range. The polyimide-aluminum photoelectric films prepared by DC magnetron sputtering have excellent optical properties and electromagnetic shielding properties, which has a wide range of application prospects in field of thermal control films, shielding films and so on.