The work aims to achieve the controlling preparation of high-performance CrN films at low temperature. High power impulse magnetron sputtering (HiPIMS) technique was used to prepare CrN films at low temperature parameters by regulating the HiPIMS discharge mode (modulated pulsed power mode-MPP and bipolar pulse power mode-BPH). XRD, FESEM, AFM, nanohardness tester and ball on disk tribological tester were used to characterize the microstructure, morphology, mechanical and tribological properties of CrN films. Compared with DCMS, HiPIMS could produce high degree of ionization of the sputtered materials, which significantly increased the ion bambordment on the growing surface by the optimal substrate bias. With enhancing ion bombardment, the surface migration energy of the adatoms increased sharply, which inhibited the growth of transgranular fracture significantly, thus achieving the refinement of grain size and improving the density of films. The surface of CrN films deposited in BPH mode showed smooth and denser structure, with the surface roughness as low as 4.6 nm. Due to the improvement of grain refinement and density, the CrN films prepared in BPH mode obtained the highest hardness of (15.6±0.8) GPa. In addition, the CrN films prepared in BPH mode showed the most excellent tribological behavior, with a lower COF of about 0.3, the films were stable and could still show excellent tribological properties under the high-speed and heavy-duty cycle conditions. The BPH mode in HiPIMS can significantly increase the surface migration energy of adatoms, promote the film growth dynamics process and achieve the controlling preparation of CrN films with excellent performance at low temperature.