The work aims to study the effects of different deposition pressures on the microstructure, mechanical properties and tribological properties of WS2 films by magnetron sputtering. WS2 films were deposited by RF magnetron sputtering technology. The micromorphology, composition and crystal orientation of the films were characterized by using scanning electron microscope (SEM) and X-ray diffraction (XRD). The mechanical properties and friction and wear properties of the films were tested respectively by using nano indentation, friction and wear tester and white light interferometer 3D profilometer. With the increase of deposition pressure, the loose and porous structure of WS2 films were decreased obviously, the coarse columnar crystal was refined obviously, and the density of WS2 films was improved effectively. When the deposition pressure was more than 0.8 Pa, WS2 films presented the preferential orientation of (101) basal plane. The hardness change of WS2 films was opposite to that of S/W atomic ratio in the films, and the elastic modulus was decreased gradually. When the deposition pressure was 0.4 Pa, most of the slip surface of WS2 films (002) was parallel to the substrate surface, the friction coefficient of WS2 film was the smallest, 0.092, but the wear resistance of WS2 film was the worst. When the deposition pressure was 1.6 Pa, the wear rate of WS2 film was the smallest, 2.34×10-7 mm3/(N?m), and the wear-resisting property of WS2 film was better. Changing the deposition pressure can significantly improve the density, mechanical properties and friction and wear properties of WS2 films.