The amorphous carbon thin film is mainly composed of a three-dimensional network in which sp3 carbon atoms and sp2 carbon atoms are intermingled with each other. It has excellent properties such as high hardness, low friction coefficient, abrasion resistance, corrosion resistance, chemical stability, etc. However, the conventional preparation methods are hard to realize the integrated control on thin film structure and performances. Due to ion deposition characteristics, high power impulse magnetron sputtering has attracted attentions from experts and researchers in the field. Recent studies on the preparation of amorphous carbon thin film by high power impulse magnetron sputtering were reviewed. The discharge characteristics of high power impulse magnetron sputtering graphite target were analyzed to point out the conditions for obtaining high ionization degree of sputtered carbon atoms in the processes of depositing amorphous carbon thin films. For low ionization degree and deposition rate, several improved high power impulse magnetron sputtering methods were introduced from the perspectives of increasing the ionization degree of carbon atoms and carbon ion transportation efficiency. The characteristics of carbon atom ionization, film deposition rate, structure and mechanical properties by different high power impulse magnetron sputtering methods were compared. Furthermore, the advantages of high power impulse magnetron sputtering in the preparation of hydrogenated amorphous carbon thin films and metal doped amorphous carbon thin films, and the applications in the frontier fields such as fuel cells, biology and sensing were discussed. Finally, the ion deposition characteristics of high power impulse magnetron sputtering graphite target, the preparation of amorphous carbon thin films and the application trends were prospected.