Atomic Layer Deposition Technology and Its Application

MIAO Hu, LI Liu-he, HAN Ming-yue, GU Jia-bin

Surface Technology ›› 2018, Vol. 47 ›› Issue (9) : 163-175.

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Surface Technology ›› 2018, Vol. 47 ›› Issue (9) : 163-175. DOI: 10.16490/j.cnki.issn.1001-3660.2018.09.022
Coating Material and Technology

Atomic Layer Deposition Technology and Its Application

  • MIAO Hu, LI Liu-he, HAN Ming-yue, GU Jia-bin
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Abstract

The development background of atomic layer deposition technology was briefly described. Then, technical principles, technical characteristics and advantages of atomic layer deposition technology were summarized, and the two self-limiting mechanisms of chemical adsorption and sequential reaction were described and compared. Hereafter, the latest results of the atomic layer deposition technology in process and other applications in nanocatalysts, batteries, semiconductor devices, optics, biomedicine and aerospace were highlighted. Among them, the applications of atomic layer deposition in batteries, semiconductor devices and biomedical applications were classified and introduced. The batteries included lithium ion batteries and solar cells. The semiconductor devices were divided into high-k dielectrics, capacitors, and resistor random access memory (RRAM), photodiode. In biomedical fields, the research progress in biocompatibility, antibacterial coatings and microscopic component directions were displayed, respectively. In the end, it summarized and prospected the development direction and application of atomic layer deposition technology.

Key words

ALD, self-limited; precursor; nano-catalyst; electric battery; semiconductor device; optics; bio-medicine; aerospace

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MIAO Hu, LI Liu-he, HAN Ming-yue, GU Jia-bin. Atomic Layer Deposition Technology and Its Application[J]. Surface Technology. 2018, 47(9): 163-175

Funding

Supported by Preresearch Fund for Weapons and Equipment Program(61409230602)
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