The work aims to research effects of different sputtering target power on structure and tribological properties of W-C:H films. With WC target as sputtering target and C2H2 as reaction gas, a series of W-C:H films were prepared on 316 stainless steel and Si(100) substrates by modulating sputtering target power. Microstructure and composition of the films were characterized with FESEM, XRD and Raman spectrum. Tribological properties of the films were analyzed with UMT-3MT multi-function friction machine. W-C was mainly distributed in amorphous carbon in the form of β-WC1?x nanocrystals, and it grew preferentially along (200) crystal face. W content in the film gradually increased as the sputtering power increased, diffraction peak of (200) face gradually increased, and sp2 content first decreased and then increased. The target power exhibited good tribological properties at 1.4 kW, friction coefficient was 0.15 and wear rate is 3.92×10?7 mm3/(N?m). As the sputtering target power gradually increases, the columnar crystals become thicker and the coating density decreases gradually. Tribological properties of the films are closely related to WC content.