The work aims to investigate the load-dependent friction hysteretic behavior of fullerene-like films (FL-C:H). The FL-C:H films were prepared on silicon substrate by direct current plasma enhanced chemical vapor deposition (DC-PECVD) technique. Field emission scanning electron microscopy (FE-SEM), X-ray photoelectron spectroscopy (XPS), high resolution transmission electron microscopy (HRTEM) and Raman spectroscopy were used to characterize the film thickness, element binding energy state and microstructure, respectively. The mechanical properties (hardness and elastic recovery) and friction hysteretic behaviors of the films were investigated with a Nano-indenter and a reciprocating friction and wear tester at different frequencies under the changing loads. Results showed that the FL-C:H films prepared with CH4 and H2 as the precursor had good mechanical properties, with the hardness and elastic modulus up to 23.42 GPa and 162.27 GPa, respectively. The elastic recovery was as high as ~82%. Furthermore, for friction with the GCr15 ball as a dual, the FL-C:H films showed good tribological properties, and there was friction hysteretic phenomenon under the cyclic loading. The friction hysteretic phenomenon of the FL-C:H films under the cyclic loading is related to the corresponding frequency. The main reason for this phenomenon is the synergistic effect of oxidation reaction and wear caused by the adsorption of H2O and O2 at the frictional interface in the atmospheric environment.