The work aims to study influencing factors of Ti-N film color, hardness and bonding strength. Multicolored Ti-N films were deposited by closed field unbalanced magnetron sputtering ion plating on 304 SUS plates and glass slides, respectively, by adjusting parameters including sputtering bias-voltage and N2 flow rate. Properties including microhardness and bonding strength of the films were evaluated by Knoop hardness, scarification and ball crater method, respectively. Color of the Ti-N films deposited at a bias of 60 V and sputtering current of 2 A changed from “faint yellow-golden-reddish yellow-fuchsia-golden” as N2 flow rate increased from 3sccm to 20sccm. Hardness of the films increased from 601HK to700HK as the flow rate of reactive gas of N2 increased. All films exhibited good bonding strength on different substrates. Provided with N2 flow rate of 10sccm and sputtering current of 2 A, and as negative bias increased 50 V to 120 V, color of the Ti-N films changed from light yellow to golden, favorable bonding strength was obtained, and no obvious change in film hardness was detected as the bias increased. Hence the film color is mainly affected by N2 flow rate and slightly affected by bias while film properties is not affected by bias significantly.