The work aims to study effects of modulation period on structure and properties of magnetron sputtered WB2/CrN multilayer films. AlB2 type WB2 and CrN films as well as corresponding multilayer composite films were deposited on silicon ship, quartz glass sheet and stainless steel, respectively in the method of dual targets DC magnetron sputtering. Phase structure and morphology were observed and analyzed with X ray diffractometer and scanning electron microscope, and hardness and film adhesion of the multilayer films were studied with Vickers microhardness tester and scratch tester. Magnetron sputtered WB2/CrN multilayer films tended to grow in columnar mode and had obvious stratified structure. Diffraction peaks of WB2 crystal were present only in the multilayer films when modulation period was over 317 nm. Critical crystallization thickness of WB2 film in the multilayer films was over 150 nm in this experiment. Growth orientation of CrN monolayer changed from (200) crystal plane to multiple crystal planes, and WB2 layer from (101) to (001) as the modulation period decreased. Hardness of the multilayer films decreased as the modulation period decreased in general, and reached the maximum when the modulation period was 317 nm. Adhesion showed a reversed variation trend against hardness. CrN layer and multilayer interfaces contributed to film adhesion improvement of composite films.