The work aimed to study influence of ion source power on structure and properties of a-C:H(Al) films. a-C:H(Al) films were deposited on n(100) type monocrystalline silicon and 16MnCr5 steel substrates by changing ion source power, ionizing CH4 gas with anode-layer ion source and magnetron sputtering Al target at intermediate frequency. Structure and properties of a-C:H(Al) films were systematically characterized with SEM, micro vickers tester, friction and wear tester, surface profiler, etc. Hardness values of the films were over 1000HV, and friction coefficient was as low as 0.05～0.15. At the power of ion resource of 450 W, the films exhibited the optimal friction coefficient and adhesion of 0.05 and 21.46 N, respectively. At the power of ion resource of 550 W, wear rate of the films was the minimum, only 3.59×10－7mm3/(N?m). The film surface was loose when the power of ion source was low, and tended to be smooth and compact as the ion source power increased. As the ion source power increased, hardness values of the films increased, while, adhesion of the films first increased and then decreased, friction coefficient first decreased and then increased while wear width, wear depth and wear rate of the films reduced.