The work aims to study preparing conditions and influencing factors of anatase TiO2 film of high refractive index at low temperature. Direct current magnetron sputtering (DCMS) technique and improved energy filtering magnetron sputtering (EFMS) technique were used to prepare TiO2 film. Effects of process parameters of DCMS technology on TiO2 film were studied in orthogonal experimental method, optimal preparation conditions of anatase TiO2 film of high refractive index at low temperature was determined. TiO2 films were deposited by taking advantage of EFMS technique under the optimal preparation conditions, and films prepared by two techniques were compared as well. Microstructure of TiO2 film was characterized with X-ray diffractometer and Raman spectrometer, surface morphology was observed with scanning electron microscope and optical property was determined and fit with spectroscopic ellipsometer. The TiO2 films prepared by DCMS and EFMS techniques had excellent single anatase structure at 100 ℃. Porosity of TiO2 prepared by EFMS technique was 4.7%, refractive index at 550 nm was 2.47 and average crystal size was 12.5 nm. Optical bandgap of the TiO2 films deposited by the DCMS and EFMS techniques was 3.37 eV and 3.08 eV, respectively. TiO2 films can be prepared at low temperature by DCMS and EFMS techniques. Films prepared by the latter feature in smaller porosity, high refractive indexes, fine and well-distributed grain and large optical bandgap.