CrN films were deposited at different peak power (52.44, 91.52, 138 kW) by taking advantage of high power impulse magnetron sputtering (HIPIMS). The influence of peak power on structure and mechanical property of CrN films were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), nano-hardness tester, friction-abrasion testing machine and scratch tester. At lower peak power of 52 kW, the ion/atom ratio was only 5.4%. The fabricated CrN films were of small grain size, low critical load as 42 N and wearing depth as 349 nm. At higher peak power of 138 kW, the ion/atom ratio was 12.5%, no film pelt off at the maximum load of 100 N and wearing depth was only 146 nm. High peak power can improve atomic ionization rate and ion bombardment to substrate, so as to realize grain recrystallization and growth of CrN films, reduce certain stress and provide excellent wear resistance and toughness for films. Therefore, the increase of peak power of target can improve the mechanical property of deposited CrN films.