Objective As a new technology with high ionization rate of sputtered materials, High Power Impulse Magnetron Sputtering (HIPIMS) has widely received more and more attention home and abroad. The form and evolution of target pulse current and plasma emission spectrum of HIPIMS discharge with V target as an example under different working pressures have been investigated, which provide theoretical basis for the further application of HIPIMS technology. Methods HIPIMS pulse discharge current waveforms were acquired by digital oscilloscope and the spectral lines were recorded by emission spectrometer. The evolution law of V target HIPIMS discharge characteristics under different pressures was analyzed. At the same time, the V film was prepared by HIPIMS technique and the morphology of the V film was observed by scanning electron microscope. Results Under different argon pressures, the peak of discharge current, the platform of discharge current and the mean discharge current all monotonicly increased with target voltage. And they increased faster and faster. However, the peak value of the target current was significantly higher than that of the platform, which was due to the pulse peak current determined by gas discharge. Ar0, Ar+, V0 and V+ intensity increased with the increase of target voltage under different pressures. The spectral intensity increased with the increase of the pressure at the same target voltage. The ionizations of Ar and V were 78% and 35% at target voltage of 610 V and Ar pressure of 0.9 Pa. In addition, the V films prepared by HIPIMS technique were smooth and dense, and had no columnar crystal growth morphology. Conclusion Higher working pressure and target pulse voltage are beneficial to obtain higher system particle ionization rate, but the HIPIMS discharge is not stable. Suitable working pressure is the key to obtain high quality film.