High power impulse magnetron sputtering (HIPIMS) is a novel technique magnetron sputtering with high ionized fraction. The advantages of HIPIMS were summarized, including high film density and smoothness, high bonding strength of film-substrate interface and good thickness uniformity on the surface of complex shape workpiece. The problems of HIPIMS were also induced, including low deposition rate and the ionization rate of low sputtering rate metal target. On this basis, the paper reviewed the recent research progress of hybrid HIPIMS. The hybrid HIPIMS with physical vapor deposition technology included hybrid DC magnetron sputtering enhanced HIPIMS, hybrid radio frequency magnetron sputtering enhanced HIPIMS, hybrid medium frequency magnetron sputtering enhanced HIPIMS, and hybrid plasma ion implantation enhanced HIPIMS. The hybrid HIPIMS with auxiliary equipment or device included adding the inductively coupled plasma enhanced HIPIMS, adding the electron cyclotron resonance device enhanced HIPIMS and adding the external magnetic field enhanced HIPIMS. In view of various forms of hybrid HIPIMS technology, the discharge behavior, ion transport properties and the structure and properties of the film were summarized, respectively. Finally, the future development trend of hybrid HIPIMS technology was prospected.