Ag/SiO2界面稳定性与羟基化效应的第一性原理研究
金立杰, 高旭红, 刘霞, 周圣煜
First-principles Calculations on the Interfacial Stability and Hydroxylation Effects of Ag/SiO2
JIN Lijie, GAO Xuhong, LIU Xia, ZHOU Shengyu
表面技术
.
2026, (7): 169
-178
.
DOI: 10.16490/j.cnki.issn.1001-3660.2026.07.014
渝公网安备 50010702501715号 渝ICP备15012534号-3