CF4等离子体背沟道表面处理对IZO TFT电学性能及负栅偏压应力稳定性的影响
王聪, 丁有坤, 刘玉荣
Effect of CF4 Plasma Back Channel Surface Treatment on Electrical Properties and Negative Gate Bias Stress Stability of IZO TFT
WANG Cong, DING Youkun, LIU Yurong
表面技术
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2025, (16): 231
-239
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DOI: 10.16490/j.cnki.issn.1001-3660.2025.16.020
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