Si和316L基片上TiN薄膜微观结构和应力的对比分析

赵升升, 程毓, 张小波, 常正凯

Comparative Study on Stress and Microstructure of TiN Films on Si and 316L Substrates

ZHAO Sheng-sheng, CHENG Yu, ZHANG Xiao-bo, CHANG Zheng-kai

表面技术 . 2022, (3): 278 -285 . DOI: 10.16490/j.cnki.issn.1001-3660.2022.03.030