基于硅靶和碳化硅靶的碳化硅薄膜磁控溅射工艺对比

杨梦熊, 惠迎雪

Comparison of Magnetron Sputtering Process of Silicon Carbide Film Based on Silicon and Silicon Carbide Target

YANG Meng-xiong, HUI Ying-xue

表面技术 . 2021, (9): 134 -140 . DOI: 10.16490/j.cnki.issn.1001-3660.2021.09.013