紫外光催化辅助SiC抛光过程中化学反应速率的影响

路家斌, 阎秋生, 廖博涛

Effect of Chemical Reaction Rate in Ultraviolet Photocatalytic Auxiliary SiC Polishing Process

LU Jia-bin, YAN Qiu-sheng, LIAO Bo-tao

表面技术 . 2019, (11): 148 -158 . DOI: 10.16490/j.cnki.issn.1001-3660.2019.11.015