直流和高功率磁控溅射制备氮化铬薄膜及其结构性能比较
李倩, 李花, 王正铎, 张海宝, 杨丽珍, 刘忠伟, 陈强
Comparison of Chromium Nitride Thin Films Deposited by Reactive Direct Current Magnetron Sputtering and High Power Pulsed Magnetron Sputtering
LI Qian, LI Hua, WANG Zheng-duo, ZHANG Hai-bao, YANG Li-zhen, LIU Zhong-wei, CHEN Qiang
表面技术
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2019, (9): 64
-69
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DOI: 10.16490/j.cnki.issn.1001-3660.2019.09.005
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