抛光垫特性对硬质合金刀片CMP加工效果的影响

毛美姣, 吴锋, 胡自化

Effects of Polishing Pad Characteristics on CMP (Chemical Mechanical Polishing) Result of Cemented Carbide Tool

MAO Mei-jiao, WU Feng, HU Zi-hua

表面技术 . 2017, (12): 270 -276 . DOI: 10.16490/j.cnki.issn.1001-3660.2017.12.042