N2流量对等离子体增强磁控溅射TiN涂层的影响
谢启, 付志强, 岳文, 王成彪
Effect of N2 Flow Rate on TiN Coatings Deposited by Plasma Enhanced Magnetron Sputtering
XIE Qi, FU Zhi-qiang, YUE Wen, WANG Cheng-biao
表面技术
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2017, (6): 161
-167
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DOI: 10.16490/j.cnki.issn.1001-3660.2017.06.025