CeO2 纳米粒子抛光液分散稳定性及其化学机械抛光特性研究
陈广林, 刘德福, 陈涛, 佘亦曦
Dispersion Stability of CeO2 Nano Particles Polishing Agent and Its Properties in Chemical Mechanical Polishing Process
CHEN Guang-lin, LIU De-fu, CHEN Tao, SHE Yi-xi
表面技术
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2016, (11): 187
-193
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DOI: 10.16490/j.cnki.issn.1001-3660.2016.11.029