目 的 研究基体表面和靶表面不同 放置方向以及沉积时间 对 Ti 大颗粒形貌和分布规律的影响。方法 利 用 电弧离 子镀方法在基体上制备 TiN 薄膜, 采用 扫描电 子显微镜??TiN 薄膜的 表面形貌, 利用 ImageJ 图 像软件对 TiN 薄膜表面中 Ti 大颗粒的数目 和尺寸进行分析。 结果 靶基间 距保持 25 cm, 当基体表面与 靶表面垂直放置时, 薄膜表面的大颗粒数目 和所占 面积比比平行放置时要少, 同 时出 现了 典型的长条状大颗粒; 随着沉积时间 从 5 min 增加到 50 min, 大颗粒数目 和所占 面积比出 现先减小后增加的趋势。 结论 选择基体表面与 靶表面垂直放置, 沉积时间 为 30 ~ 40 min 时, 薄膜的沉积厚度和减少大颗粒缺陷可以兼顾。

Objective The effects of different placement orientation between substrate surface and target surface and the deposition time on the morphology and distribution of Ti macroparticles ( MPs) were studied. Methods TiN films were deposited on the substrate by the arc ion plating method, the surface morphology of the Ti films was observed by the Scanning electron microscopy ( SEM) method, and the amount and size of Ti MPs in the surface of TiN films were analyzed using the scientific image software ImageJ. Results When the distance between the target and the substrate was 25 cm, the amount and area fraction of MPs in the films were lower when the substrate surface and the target surface were placed perpendicularly, as compared to those when the substrate surface and the target surface were placed in parallel. Meanwhile, a typical strip shape MPs appeared. With the deposition time increasing from 5 min to 50 min, the amount and the area fraction showed a trend of first decreasing followed by increasing. Conclusion When the placement orientation was perpendicular between the substrate surface and the target surface, and the deposition time was 30 ~ 40 min, the deposition thickness of the film and the reduction of MPs could be achieved at the same time.