联氨-氨配合体系化学镀纯镍工艺

宋秉政, 赵亚萍, 蔡再生

表面技术 ›› 2013, Vol. 42 ›› Issue (6) : 48-51.

PDF(2870 KB)
PDF(2870 KB)
表面技术 ›› 2013, Vol. 42 ›› Issue (6) : 48-51.

联氨-氨配合体系化学镀纯镍工艺

  • 宋秉政, 赵亚萍, 蔡再生
作者信息 +

Study on the Process Hydrazine Reduction of Electroless Pure Nickel Plating

  • SONG Bing-zheng, ZHAO Ya-ping, CAI Zai-sheng
Author information +
文章历史 +

摘要

目的 优化联氨-氨配合体系化学镀纯镍的工艺条件。 方法 以壳聚糖为织物的预处理剂,通过单因素实验,探讨化学镀镀液各组分的浓度和 pH 值、温度、施镀时间等因素对化学镀纯镍锦纶织物的方阻和增重率的影响。 结果 最优化学镀工艺条件如下:乙酸镍质量浓度 45 g / L,水合肼质量浓度 20 g / L,硫酸铵质量浓度 8 g / L,镀液 pH 值为 9 ,施镀温度为 75 ℃ ,施镀时间为 2 h。 结论 采用此反应体系,锦纶织物经壳聚糖改性处理后,可在最优施镀工艺条件下得到纯镍镀层,且镀层致密,方阻较小。

Abstract

Objective In this paper, the optimal process conditions of electroless nickel plating in hydrazine-ammonia complex system were studied. Methods With chitosan as a pretreatment agent, the influences of the concentration of each component in the plating bath and the processing conditions were discussed. Results The optimal process conditions were as follows: the concentration of nickel acetate 45 g / L, the concentration of hydrazine hydrate 20 g / L, the concentration of ammonium sulfate 8 g / L, the pH value of bath 9 , the temperature of electroless plating 75 ℃ , the time of electroless plating 2 h. Conclusion In this reaction system, polyamide fiber modified by chitosan can obtain thick and firm adherence electroless pure nickel coating, and lower square resistance, under the optimal technological conditions.

关键词

化学镀纯镍; 水合肼; 壳聚糖; 方阻

Key words

electroless pure nickel; hydrazine hydrate; chitosan; square resistance

引用本文

导出引用
宋秉政, 赵亚萍, 蔡再生. 联氨-氨配合体系化学镀纯镍工艺[J]. 表面技术. 2013, 42(6): 48-51
SONG Bing-zheng, ZHAO Ya-ping, CAI Zai-sheng. Study on the Process Hydrazine Reduction of Electroless Pure Nickel Plating[J]. Surface Technology. 2013, 42(6): 48-51

基金

国家自然科学基金青年科学基金项目(51203018) ;上海市自然科学基金面上项目( 12ZR1400400 ) ;生态纺织教育部重点实验室( 东华大学 / 江南大学) 资助课题(12D10534)

PDF(2870 KB)

Accesses

Citation

Detail

段落导航
相关文章

/