采用射频磁控溅射方法在玻璃基底上制备氮化铜薄膜,研究了氮氩混合气体中的氮气比例对薄膜择优生长取向、表面晶粒尺寸和微观力学性能的影响。 结果表明:低氮气比例时,薄膜的纳米力学性能比较差;随着氮气比例的增加,氮化铜薄膜的择优生长晶面从( 111 ) 晶面转变为( 100 ) 晶面,晶粒尺寸变小, 显微硬度增加,弹性模量则是先增加,后减小。

Copper nitride thin films were prepared on silicon glass substrates by means of RF magnetron sputtering deposition, and then the effects of nitrogen partial pressure in a fixed-total N₂-Ar mixture sputtering gas flow on the preferential crystalline orientation, the size of surface grain and micro-mechanical properties were investigated. It is showed that when the nitrogen partial pressure is low, the nano-mechanical property of the thin film is poor. As nitrogen partial pressure improves the preferential orientation transforms from plane (111 ) to plane (100 ) , the crystalline grain size shrinks and the elastic modulus first increases but then decreases.