以 0 . 2 mol / L Ba( OH)₂+0 . 2 mol / L Sr( OH)₂ 溶液为电解液,采用微弧氧化法,在 Ti 板表面原位生长铁电薄膜,并对薄膜的物相构成、元素分布情况、截面结构及介电性能进行表征。 结果表明:该工艺下制备的薄膜主要由四方相 Ba_0.5Sr_0.5TiO₃ 构成,薄膜致密层内,Ba,Sr,Ti 和 O 元素分布都较均匀,但在微弧氧化孔洞附近存在含量波动;该薄膜在 1 kHz 下的介电常数较优,为 411 . 3 。 最后对微弧氧化沉积铁电薄膜的成膜过程进行了分析,提出了微弧氧化过程中可能存在的化学反应。

Ba_0.5Sr_0.5TiO₃thin films were conducted by microarc oxidation and placing titanium plates as anode in 0 . 2 mol / L barium hydroxide & 0 . 2 mol / L strontium hydroxide aqueous solution. Phase composition, elements distribution, cross section structure and dielectric properties of the films were characterized. The results show that the films are composed mainly of tetragonal Ba_0.5Sr_0.5TiO₃phases. The distribution of Ba, Sr , Ti, and O element is uniform in dense layer in addition to micropore area. The film has excellent dielectric property, in the frequency of 1 kHz dielectric constant value is 411 . 3 . At last, the formation process of ferroelectric films deposited by microarc oxidation was analyzed, possible chemical reactions of the film’s growth were suggested.