三价铬电沉积铬基二元合金工艺的研究进展

屠振密, 胡会利, 侯峰岩

表面技术 ›› 2012, Vol. 41 ›› Issue (6) : 91-94,103.

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PDF(4080 KB)
表面技术 ›› 2012, Vol. 41 ›› Issue (6) : 91-94,103.

三价铬电沉积铬基二元合金工艺的研究进展

  • 屠振密1, 胡会利1, 侯峰岩2
作者信息 +

Review of Chromium Binary Alloy Electrodeposition Technologies from Trivalent Chromium Baths

  • TU Zhen-mi1, HU Hui-li1, HOU Feng-yan2
Author information +
文章历史 +

摘要

近年来,由于六价铬的毒性及其对环境的严重危害,加快了三价铬电沉积的研究。但三价铬电沉积难以获得厚铬镀层,而铬基二元合金在镀厚性方面具有明显的优势。详细总结了三价铬体系电沉积铬镍、铬铁、铬钴、铬磷、铬碳和锌铬等二元合金的工艺,并简述了镀层的特性及应用。三价铬合金电镀将会在生产中有着广阔的应用前景。

Abstract

Since hexavalent chromium has bad effects on environment, research on the trivalent chromium electrodeposition has been accelerated. Thick chromium coatings are difficultly deposited from trivalent chromium bath, and chromium binaryalloy coatings have distinct advantages at deposit thickness. Electrodeposition technologies of Cr-Ni, Cr-Fe, Cr-Co, Cr-P, Cr-C and Zn-Cr from trivalent chromium bath were summerized. The binaryalloy coatings characteristics and application were briefly introduced also. Chromium binary alloy electrodeposited from trivalent bath promisingly will have a wide application prospect in industry.

关键词

三价铬; 电沉积; 铬基二元合金; 工艺; 镀层特性

Key words

trivalent chromium; electrodeposition; chromium binaryalloy; technology; coating characteristics

引用本文

导出引用
屠振密, 胡会利, 侯峰岩. 三价铬电沉积铬基二元合金工艺的研究进展[J]. 表面技术. 2012, 41(6): 91-94,103
TU Zhen-mi, HU Hui-li, HOU Feng-yan. Review of Chromium Binary Alloy Electrodeposition Technologies from Trivalent Chromium Baths[J]. Surface Technology. 2012, 41(6): 91-94,103

基金

中央高校基本科研业务费专项资金(HIT. NSRIF. 2009154)

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