目的 为了实现氧化锆（ZrO2）陶瓷的高效率、低损伤和低成本的精密抛光,以及磁场辅助剪切增稠抛光工艺的进一步拓展。方法 提出了基于Halbach阵列的磁场辅助剪切增稠抛光方法。首先制备了一系列羰基铁粉浓度的磁性剪切增稠浆料并开展流变特性实验,优选出增稠效应最显著的抛光液。其次对Halbach阵列进行仿真分析,确定了永磁体个数。最后以自制黏接性Halbach阵列对ZrO2进行剪切增稠抛光,进行系统的工艺参数的研究和分析,阐明其对ZrO2表面粗糙度（Ra）和材料去除率（MRR, ηMRR）的影响规律,并在最优抛光参数组合下进行抛光实验,验证其抛光效果。结果 11个永磁体组成的Halbach阵列产生的磁感线回路数量多,中心磁场分布均匀,为后续磁场辅助抛光实验提供了理想的磁场源。羰基铁粉含量为4%的磁性剪切增稠抛光液,在磁感应强度为150 mT时,表现出最显著的剪切增稠效果,即更高的峰值黏度结果和更广的稳定增稠区间。通过提升抛光转速,带动流体的运动速度增大,进而增大剪切速率,从而提升氧化锆陶瓷的表面质量和材料去除率;抛光角度的增加导致抛光液对ZrO2的作用力从剪切应力变为法向冲击,从而降低材料去除率;ZrO2工件的自转使表面各区域受力均匀,增强边缘抛光强度。在优化的抛光工艺参数组合下,ZrO2抛光60 min后,波纹度变化小,整体呈现出光滑、平整的结果,Ra从601 nm降至11 nm,MRR值达到了7.26 μm/h;并且与未加磁场作用的传统剪切增稠方法相比,Ra下降低了85.6%,MRR值提升了1.33倍。结论 Halbach阵列的磁场辅助剪切增稠抛光方法有效地提高了氧化锆陶瓷的表面质量和材料去除率,实现高效、低损伤和低成本加工。
Abstract
Zirconia (ZrO2) ceramics are extensively utilized in the aerospace, automotive, and biomedical sectors due to their exceptional mechanical properties and favorable biocompatibility. However, the inherent high hardness and brittleness of ZrO2 pose significant challenges for conventional polishing tools in achieving effective surface removal of workpieces. To achieve high-efficiency, low-damage, and low-cost precision polishing of zirconia ceramics, and to further extend the magnetic field-assisted shear thickening polishing process, this study, based on magnetic-field-assisted shear thickening polishing technology, incorporates a Halbach-array magnetic field and employs magnetic field arrangement control methods. It proposes a Halbach-array magnetic-field-assisted shear thickening polishing method, achieving high-efficiency, low-damage, and low-cost precision polishing of ZrO2 ceramics.
Firstly, the magnetic-field rheological response characteristics of magnetic polishing slurries are investigated. Magnetic-field rheological tests are conducted on magnetic shear thickening slurries prepared with carbonyl iron powder at different mass fractions. Based on evaluation criteria including higher peak viscosity results and a broader stable thickening range, a magnetic shear thickening polishing slurry containing 4% iron carbonyl powder (at a magnetic induction of 150 mT) is selected as the optimal formulation. This formulation demonstrates the most pronounced synergistic enhancement effect between magnetorheological and shear thickening properties. Secondly, the magnetic field distribution of the Halbach array is analyzed through simulation and experimental methodology. By simulating the dimensions and arrangement of the magnets, a Halbach array magnetic field is designed comprising 11 magnets, characterized by a large and uniformly distributed magnetic flux excitation area. Based on these results, a Halbach array is fabricated and its magnetic flux density is measured. The measurements indicate an average magnetic flux density of 150.2 mT, distributed relatively uniformly across the central region, providing a reliable magnetic field source for subsequent polishing experiments. Finally, Halbach-array magnetic-field-assisted shear thickening polishing experiments are conducted on ZrO2. Through systematic design of experimental process parameters, the influence patterns on the surface roughness (Ra) and material removal rate (MRR) of ZrO2 are elucidated. The rotation of the ZrO2 workpiece ensures uniform force distribution across all surface areas, thereby enhancing edge polishing intensity and reducing polishing irregularities. Optimization experiments employing the signal-to-noise ratio method for polishing parameter combinations are conducted to validate their polishing efficacy. The results indicate that under the magnetic field conditions of a Halbach array comprising 11 magnets, increasing the polishing rotational speed enhances fluid velocity, thereby elevating shear rates. This generates a greater number of particle clusters containing abrasive grains, which remove micro-protrusions from the ZrO2 surface. Consequently, both the surface quality of the ZrO2 and the material removal rate are improved. By increasing the polishing angle, the action of the polishing fluid on ZrO2 shifts from shear stress to normal impact, reducing the tangential velocity component and lowering the shear rate, thereby decreasing the material removal rate. Under the conditions of the self-built experimental platform, the optimal polishing process combination is as follows: polishing speed of 80 rpm, polishing angle of 30°, and workpiece rotational speed of 48 r/min. Following 60 minutes of polishing, the surface waviness of the ZrO2 exhibits minimal change, presenting an overall smooth and flat result. The Ra decreases from 601 nm to 11 nm, with the MRR reaching 7.26 μm/h. Compared with the conventional shear thickening method without magnetic field application, the Ra reduction amounts to 85.6%, while the MRR is increased by a factor of 1.33.
In summary, the Halbach-array magnetic-field-assisted shear thickening polishing method effectively enhances the surface quality and material removal rate of zirconia ceramics, enabling efficient, low-damage, and low-cost processing.
关键词
氧化锆陶瓷 /
剪切增稠抛光 /
Halbach阵列 /
材料去除率 /
磁场辅助 /
流变特性
Key words
zirconia ceramics /
shear thickening polishing /
Halbach array /
material removal rate /
magnetic-field- assisted /
rheological properties
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基金
河南省高等学校重点科研项目（25CY026,25A130008）; 南阳市科技攻关计划项目（25KJGG315）
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