目的 微晶玻璃因其非均质结构,在传统抛光中易产生次表面损伤和表面缺陷,影响其性能与应用。为提升其磁性磨粒抛光精度,实现超光滑、低缺陷表面的抛光,本研究提出采用纳米二氧化硅改性磁性磨粒进行抛光。方法 采用黏结法制备了添加亲水性或疏水性纳米二氧化硅颗粒以及不添加纳米颗粒的磁性磨粒。使用N-S阵列抛光工具对微晶玻璃工件进行抛光。利用三维表面轮廓仪测量抛光前后面粗糙度,通过光学显微镜和接触角测量表征磨粒形貌、亲疏水性以及抛光前后磨损变化情况,采用测力仪（Kistler 9139AA）在线采集抛光力数据并计算动摩擦系数,采用氢氟酸蚀刻表面凝胶层,观察亚表面损伤情况。结果 疏水改性磁性磨粒抛光效果最优,抛光后工件面粗糙度降至Sa=17 nm,显著优于亲水改性磨粒的Sa=24 nm和未改性磨粒的Sa=48 nm。表面形貌观察表明,疏水改性磨粒抛光表面损伤最少,而亲水改性及未改性磨粒表面分别观察到脆性剥落痕迹与点坑缺陷。抛光力测试显示,疏水改性磨粒在抛光中的动摩擦系数最低（μ= 0.31）,低于亲水改性（μ=0.35）和未改性磨粒（μ=0.42）。疏水改性磁性磨粒在抛光后造成的亚表面损伤最少。结论 纳米二氧化硅可有效调控磁性磨粒的亲疏水性,显著提升其对微晶玻璃的抛光性能。疏水改性磁性磨粒增强了界面润滑性,降低了机械去除作用和动摩擦系数,从而实现了更高的材料去除效率、更低的表面粗糙度(Sa=17 nm)和更少的表面/亚表面损伤,为微晶玻璃的超光滑低缺陷抛光提供了有效途径。
Abstract
Glass-ceramics represent a class of multiphase composite materials characterized by their heterogeneous microstructure which combines an amorphous glass phase with crystalline ceramic phases. While conferring superior mechanical properties and thermal stability compared to conventional glass materials, this structure simultaneously presents significant challenges in precision machining due to the disparate mechanical responses of the constituent phases. Conventional processing methods often induce substantial subsurface damage and surface defects, including micro-cracks, pits, and brittle fractures, which ultimately compromises the material's performance and service reliability in advanced applications. The work aims to address these challenges through the development of an innovative surface modification strategy for magnetic abrasive particles (MAPs) with nano-silica to achieve high-precision, low-damage polishing of glass-ceramics, with focus on optimizing the interfacial chemistry and mechanical action during the polishing process.
The experimental methodology encompassed the fabrication of three distinct types of MAPs through a precisely controlled bonding process: conventional MAPs without nano-silica addition, MAPs incorporating hydrophilic nano-silica particles (20 nm), and MAPs incorporating hydrophobic nano-silica particles (20 nm). All MAP variants maintained identical base compositions consisting of iron powder (75 μm average particle size) and CeO2 abrasives (15 μm) in a consistent 12∶3 mass ratio, with nano-silica additions standardized at 1 part by mass relative to the base mixture. The manufacturing process involved systematic mixing, ultrasonic dispersion for homogeneous distribution, thermal curing at 60 ℃ for 1 hour, followed by mechanical crushing and sieving operations to obtain MAPs with controlled average particle size of 115 μm. Comprehensive polishing experiments were conducted with an N-S array magnetic tool on precisely prepared glass-ceramic workpieces (20 mm×20 mm×4 mm), with the polishing mechanism leveraging the formation of flexible abrasive brushes under magnetic effects while maintaining continuous deionized water supply to facilitate essential hydration reactions.
Advanced characterization techniques were employed to evaluate the performance of the developed MAPs. Quantitative surface analysis utilized 3D surface profilometry with five-point averaging methodology to ensure measurement reliability, while surface energy characteristics were investigated through contact angle measurements. Real-time polishing dynamics were monitored by a Kistler 9139AA dynamometer with sampling frequency maintained at 1 000 Hz, enabling precise calculation of dynamic friction coefficients throughout the polishing process. Critical assessment of subsurface damage was performed through controlled hydrofluoric acid etching protocols, which effectively revealed hidden microstructural damage beneath the polished surfaces that would otherwise remain undetected by conventional surface analysis methods.
The experimental results demonstrated remarkable performance enhancements through the strategic implementation of nano-silica modifications. Hydrophobic MAPs achieved exceptional surface quality, reducing average roughness to Sa=17 nm, which represented 65% and 29% improvements over unmodified (Sa=48 nm) and hydrophilic MAPs (Sa= 24 nm), respectively. Analysis of surface morphology revealed that hydrophobic MAPs produced surfaces with minimal visible damage and uniform texture, while unmodified MAPs left characteristic pit defects and hydrophilic MAPs generated brittle spalling marks indicative of aggressive mechanical action. The dynamic friction coefficient during processing with hydrophobic MAPs measured at μ=0.31, significantly lower than values recorded for hydrophilic- modified (μ=0.35) and unmodified MAPs (μ=0.42), suggesting superior interfacial conditions and reduced mechanical damage. Microstructural analysis provided compelling evidence for the enhanced performance mechanisms, with contact angle measurements confirming effective modulation of surface wettability characteristics. Most significantly, hydrofluoric acid etching tests demonstrated that hydrophobic MAPs induced the least subsurface damage, with etched surfaces showing minimal micro-cracking compared to extensive crack networks revealed on surfaces processed with other MAP types.
The superior performance of hydrophobic magnetic abrasive particles (MAPs) stems from their ability to optimize water distribution at the workpiece-abrasive interface, thereby accelerating interfacial reaction kinetics while maintaining effective mechanical removal characteristics. The hydrophobic properties may promote the formation of a uniform and stable interfacial layer (such as silicic acid gel) on the glass-ceramic surface, while the incorporated nano-silica particles may also contribute to chemical interactions within the interfacial region. This creates favorable conditions for chemo mechanical processing where chemical softening and mechanical shear operate synergistically, enabling highly efficient material removal while preserving structural integrity. Research indicates that surface engineering of magnetic abrasives via hydrophobic nano-silica functionalization provides a scientifically grounded and technologically viable solution for the precision manufacturing of glass- ceramics. This approach is particularly suitable for applications requiring extremely smooth surfaces, minimal subsurface damage, and enhanced functional performance.
关键词
磁性磨粒抛光 /
纳米二氧化硅 /
表面粗糙度 /
微晶玻璃 /
亚表面损伤 /
剪切力
Key words
magnetic abrasive polishing /
nano-silica /
surface roughness /
glass-ceramics /
subsurface damage /
shear force
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基金
国家自然科学基金（面上）（52227809,52475446）; 安徽省自然科学基金项目（面上）（2308085ME170）; 安徽省科技创新攻坚计划重大重点项目（202423i08050035）; 浙江省教育厅一般科研项目（Y202454613）; 温州市应用基础研究（基础研究）项目（GK20250148）
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